Photoresist & Photoresist Ancillaries Market Predicted to Rake in Revenues of US$ 4.2 Billion by 2025, MarketsandMarkets™ Report
In the global photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2020 and projected to reach USD 4.2 billion by 2025, at a CAGR of 4.8%. A photoresist is a light-sensitive chemical used to create the desired pattern on the substrate during photolithography or photoengraving.
In a positive resist, the portion of the photoresist that is exposed to light becomes soluble in the photoresist developer. The unexposed portion of the photoresist remains insoluble in the photoresist developer. A negative photoresist is a type of photoresist in which the portion that is exposed to light becomes insoluble in the photoresist developer. The photoresist developer dissolves the unexposed portion of the photoresist.
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Photoresists are classified broadly based on their response to a specific wavelength of light. These materials are sensitive to wavelengths 193 nm (ArF), 248 nm (KrF), 365 nm (I-line), and 436 nm (G-line). Among the mentioned photoresists, ArF is the most widely used as it provides superior resolution with low defect levels, owing to its narrow wavelength and ability to break through a 10 nm level. Antireflective coating, developer, and remover are some of the types of photoresist ancillaries that are majorly used during photolithography.
The photoresist and photoresist ancillaries market is classified based on the application as semiconductor &ICs, LCD, printed circuit boards, and others (NEMS, MEMS, sensors). Among them, semiconductor & ICs is the largest application due to the production of huge volumes of integrated circuits or chips due to the growing demand.
The photoresist and photoresist ancillaries market is studied for five regions, namely APAC, North America, Europe, South America, and Middle East & Africa. APAC is expected to be the fastest-growing regional market due to the growing chip production in Taiwan, China, Japan, and South Korea.
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JSR Corporation, Tokyo Ohka Kogyo (TOK), Shin-Etsu Chemicals are the top players in the market. The market ranking for the top companies is determined by considering the year of establishment, geographical presence, several recent developments, and the company’s product offering in the photoresist and photoresist ancillaries market. JSR Corporation is the top player in the market. JSR Corporation is one of the largest rubber and chemical solutions offering companies in the world. It’s headquartered is in Japan. The company operates through four business segments, namely, elastomers, plastic, digital solution, and life sciences. It offers photoresist material under the digital solution business. The company has also performed well, generating revenues worth USD 4.4 billion in 2019.
The leading players in the global photoresist and photoresist ancillaries market includes Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).
JSR Corporation (Japan) is one of the most extensive rubber & chemical solutions offering companies worldwide. The company operates through four business segments: elastomers business, plastic business, digital solution business, and lifesciences business. It offers photoresist materials under the digital solution business. The company has its presence in 41 overseas locations, including the US, Europe, China, South Korea, Taiwan, and Thailand.
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